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High Purity and High Performance cleaning solutions

CA-HP series 

Semiconductors
  • Highly purified aqueous citric acid soln.
  • Suitable for the manufacture of the Si wafer, washing regeneration step.
Product name Features Application example
CA-HP 10 High Purity aqueous solution of 10 % citric acid Various raw materials of cleaning solns.
Cleaning soln. for removing metal impurities (wafer fabrication process, the reclaim process)
CA-HP 30 High Purity aqueous solution of 30 % citric acid

Packaging

  • a cardboard case of 10Lx2 bottles

Related laws and regulations

TSCA Listed
EINECS Listed

CLEAN series  

SemiconductorsLED
  • capable of removing particles and impurities metal ions generated in the Cu-CMP process at the same time
  • having extremely low etching rate for the various materials on the wafer surface
  • The liquid chemical composition is excellent for worker safety and environmental compliance.
Product name Features Application example
CLEAN-100 High Purity and High Performance citric acid aqueous soln.
One-step cleaning soln. for metal impurities and particles.
Post CMP cleaning soln.
Post Cu-CMP cleaning soln.
Post Cu/low-k cleaning soln.

Packaging

  • CLEAN-100 :
    ・200L drum
    ・10L x 2 bottles

Related laws and regulations

TSCA -
EINECS -

WCP series 

Semiconductors
  • Neutral cleaning soln. 
  • Possible to remove fine particles without causing surface dirt due to corrosion of the W surface, .
Product name Features Application example
WCP-200 High Performance and High Purity natural amine aqueous soln. Post W-CMP cleaning soln.

Packaging

  • Negotiable

Related laws and regulations

TSCA -
EINECS -

Application

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